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Uv workflow improvements (#531)

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* Uv workflow improvements

* Uv workflow improvements

* linter improvements

* pytproject.toml fixes

* pytproject.toml fixes

* pytproject.toml fixes

* pytproject.toml fixes

* pytproject.toml fixes

* pytproject.toml fixes

* windows fixes

* windows fixes

* windows fixes

* windows fixes

* windows fixes

* windows fixes

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix

* win32 fix
This commit is contained in:
Sebastian Raschka
2025-02-16 13:16:51 -06:00
committed by GitHub
parent 29353c74d8
commit a08d7aaa84
29 changed files with 382 additions and 321 deletions
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17
pyproject.toml
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@@ -9,12 +9,12 @@ dependencies = [
"jupyterlab>=4.0",
"tiktoken>=0.5.1",
"matplotlib>=3.7.1",
"tensorflow>=2.18.0",
"tensorflow>=2.18.0; sys_platform != \"win32\"",
"tensorflow-cpu>=2.18.0; sys_platform == \"win32\"",
"tqdm>=4.66.1",
"numpy>=1.26,<2.1",
"pandas>=2.2.1",
"psutil>=5.9.5",
"packaging>=24.2",
"pip>=25.0.1",
]
[tool.setuptools.packages]
@@ -27,3 +27,14 @@ llms-from-scratch = { workspace = true }
dev = [
"llms-from-scratch",
]
[tool.ruff]
line-length = 140
[tool.ruff.lint]
exclude = [".venv"]
# Ignored rules (W504 removed)
ignore = [
"C406", "E226", "E402", "E702", "E703",
"E722", "E731", "E741"
]